OTHER BRANDS

1.Functions

Plasma confinement & electric field tuning The focus ring surrounds the wafer on the electrostatic chuck. It shapes and homogenizes the RF electric field above the wafer surface to maintain uniform plasma density across wafer edge and center, ensuring consistent etch rate and CD uniformity.
High voltage electrical insulation The integrated insulator ring isolates high-voltage electrode components from chamber hardware. It prevents leakage current and stray discharge under high RF bias conditions, avoiding arcing inside the vacuum chamber.
Wafer edge process protection It shields the wafer edge and ESC chuck from uneven plasma bombardment, reducing edge etch non-uniformity and minimizing plasma damage to electrostatic chuck surface. www.plcva.com
Thermal management & plasma erosion resistance Fabricated from high-purity ceramic material. It withstands high-energy plasma bombardment, high temperature and reactive process gas corrosion during continuous etch cycles. It maintains stable thermal conduction inside vacuum chamber.
Chamber process repeatability This consumable component wears gradually after many wafer runs. Replacing the assembly restores plasma condition, stabilizes process performance and reduces wafer-to-wafer variation.

Lam Research 715‑119652‑305 REV.A Focus Ring

Lam Research 715‑119652‑305 REV.A Focus Ring

This is a critical consumable spare part for Lam Research plasma etch process chambers for semiconductor wafer fabrication.

Front-end wafer processing: Dielectric etch, conductor etch for logic, DRAM and NAND chips.
Installed on electrostatic chuck (ESC) inside Lam etch chamber, surrounding the wafer during plasma etching. www.plcva.com
Periodic preventive replacement: After certain wafer lot counts, the worn ring assembly must be swapped out to maintain etch uniformity.
Used in semiconductor cleanroom production lines for chamber maintenance, tool PM and spare inventory stocking.