Honeywell

Main Common Functions for Three Cartridges

Toxic‑gas concentration measurement: Electrochemical cell converts target‑gas chemical reaction into measurable electrical signal, delivers ppm‑level gas concentration readings to MIDAS detector main unit.More products: www.plcva.com
Plug‑and‑play smart cartridge: Built‑in memory stores factory calibration parameters, gas type, measuring range, alarm thresholds; auto‑recognition after insertion, no manual field calibration required upon replacement.
Work with extractive sampling system: Cooperates with MIDAS built‑in pump; draws gas sample from local or remote sampling points (max 30 m distance) to realize remote gas monitoring.
Signal transmission: Send real‑time gas‑concentration data to MIDAS main chassis; chassis further outputs 4‑20 mA analog signal, relay alarm contacts, Modbus‑TCP digital communication for upper‑level DCS / PLC / SCADA system.
Self‑diagnosis: Monitor sensor ageing, end‑of‑service‑life status, fault conditions; report fault alarm to host detector, remind user of cartridge replacement.
Long‑term continuous online monitoring: Typical service life ≥24‑month under normal industrial environment; support 0‑40 ℃ operating temperature range.

Honeywell MIDAS‑E‑HAL / MIDAS‑E‑O3X / MIDAS‑E‑NH3

MIDAS‑E‑HAL: Detect halogen‑series corrosive toxic gases (chlorine, hydrogen chloride, bromine). Suited for mixed‑halogen leak monitoring in semiconductor wet‑process area.
MIDAS‑E‑O3X: High‑sensitivity ozone detection, low measuring range (0‑0.4 ppm), suitable for trace‑ozone leakage monitoring for ozone‑generating and ozone‑processing equipment.
MIDAS‑E‑NH3: Ammonia measurement, measuring range 0‑100 ppm, fast response ≤10 s; monitor ammonia leakage from etching, cleaning and cooling‑system equipment.

Honeywell MIDAS‑E‑HAL / MIDAS‑E‑O3X / MIDAS‑E‑NH3

Target industries: Semiconductor wafer fabrication, photovoltaic manufacturing, chemical plants, water‑treatment ozone disinfection workshops, laboratory toxic‑gas safety monitoring, pharmaceutical production.
Monitored equipment & scenarios: Wet‑etch process station, ozone generator, ammonia cooling system, halogen‑chemical storage cabinet, chemical‑vent exhaust duct, toxic‑gas‑using production area.
Purpose: Real‑time online leak detection of corrosive and toxic process gas; trigger local LED alarm, relay interlock and remote system alarm when gas concentration exceeds threshold; protect personnel safety, satisfy factory EHS safety compliance requirement; support predictive safety management for hazardous‑gas process system.