Advanced Energy PDX 900-2V 3156024-154A Low-Frequency RF Plasma Generator

  • Warranty: 365 days
  • Quality: Original module
  • Condition: New / Used
  • Warehouse: Spot
  • Delivery time: Shipped in 3 days after payment
  • Mailbox:plcvarious@foxmail.com

Introduction

1.Functions

  1. RF Power Generation & Precision Regulation It converts single-phase AC mains input into stable 350kHz low-frequency RF power, with adjustable output power from 8W up to 900W. It supports closed-loop power regulation, maintains high power accuracy (±1% of setpoint) under dynamic load changes, and can operate in continuous or pulse mode (pulse frequency up to 10kHz).plcva.com
  2. Built-in Impedance Matching Integrated automatic matching network covers impedance range of 25Ω ~125Ω. It dynamically tunes the load impedance to match the 50Ω source output, minimizes reflected RF power, protects the generator and plasma chamber, and ensures stable plasma ignition and maintenance.
  3. Multi-Interface Digital Communication & Remote Control Supports RS232, Ethernet and PROFIBUS industrial communication protocols. It enables remote setpoint adjustment, real-time status monitoring, fault readback and integration with host equipment PLC. Local digital panel is available for manual operation and parameter display.
  4. Multi-layer Protection Mechanism Equipped with over-current, over-voltage, over-temperature, reflected power and arc detection protection circuits. It will cut off RF output rapidly when abnormal conditions occur to avoid damage to the power supply and process chamber. Forced air cooling system ensures stable long-running performance under industrial working conditions.

Advanced Energy PDX 900-2V 3156024-154A

Advanced Energy PDX 900-2V 3156024-154A

2. Applications / Purposes

This RF generator supplies controlled low-frequency RF energy to generate and sustain plasma, mainly used in semiconductor wafer fabrication processes:

  1. Plasma Etching & Reactive Ion Etching (RIE) Generates plasma to chemically and physically etch thin films on silicon wafers for IC pattern definition.www.plcva.com
  2. RF Sputtering & Thin Film Deposition Provides RF bias power for sputtering systems to deposit metallic, dielectric thin films onto wafers.
  3. Wafer Surface Treatment & Plasma Cleaning Plasma surface activation, descum and chamber cleaning for semiconductor processing tools.
  4. Other Industrial Plasma Processes Also applicable to glass coating, material surface modification and precision plasma processing beyond semiconductor industry.plcva.com

Advanced Energy PDX 900-2V 3156024-154A

Advanced Energy PDX 900-2V 3156024-154A

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